In advanced electronics manufacturing, cleaning is a critical process that directly impacts product quality, yield, and reliability. As device structures become increasingly complex and feature sizes continue to shrink, the removal of particles, residues, contaminants, and unwanted films becomes more challenging than ever. Alfa Chemistry provides a comprehensive portfolio of high-performance cleaners specifically designed for integrated circuit (IC) and flat panel display (FPD) manufacturing. Our cleaning solutions help customers achieve superior surface cleanliness, stable process performance, and enhanced production efficiency.
The Importance of Cleaning in Electronics Manufacturing
Cleaning processes are essential throughout semiconductor and display fabrication. During manufacturing, various contaminants can accumulate on substrates and device surfaces, including:
- Organic residues from photoresists and processing chemicals
- Metallic contaminants
- Particles and dust
- Oxide residues
- Post-etch residues
- Process by-products and surface impurities
If these contaminants are not effectively removed, they can lead to pattern defects, poor film adhesion, electrical failures, reduced device performance, lower yields, and long-term reliability issues.
Our Products
Alfa Chemistry's cleaners are formulated to provide efficient contaminant removal while maintaining excellent compatibility with sensitive materials and advanced device structures. The table below lists the cleaner products we can provide and their primary functions.
| Catalog Number | Product Name | Function | Application Field |
| ACSEM-FC-0026 | Edge beam reagent /thinner | Photoresist diluent | IC |
| ACSEM-FC-0027 | Post-etch residue remover | Dry etching residue removal | IC |
| ACSEM-FC-0028 | Aluminum process cleaning agent | Dry etch residue cleaning in Al process (>130 nm) | IC |
| ACSEM-FC-0029 | Copper process cleaning agent | Dry etch residue cleaning in Cu process (130 nm-40 nm) | IC |
| ACSEM-FC-0030 | TiN etching cleaning agent | Dry etch residue cleaning with TiN hard mask in Cu process (40 nm-12 nm) | IC |
| ACSEM-FC-0031 | AIOx etching cleaning agent | 10 nm process AIOx cleaning and removal | IC |
| ACSEM-FC-0032 | Thinner | Cleaning of photoresist residues in equipment and pipes | FPD |
Typical Applications
In IC manufacturing, cleaners play a critical role throughout wafer fabrication processes. They are widely used for wafer surface preparation, particle removal, post-etch residue cleaning, photoresist residue removal, metal contamination control, and pre-deposition surface conditioning. Effective cleaning helps eliminate organic contaminants, particles, and process by-products that can negatively affect lithography, etching, deposition, and packaging processes.
In FPD manufacturing, cleaners are essential for maintaining the cleanliness of glass substrates, thin films, and functional layers used in display devices. They are commonly applied in substrate cleaning, post-etch cleaning, particle removal, residue elimination, and surface preparation before coating or deposition processes. Effective cleaning helps prevent display defects such as uneven brightness, poor adhesion, and electrical failures while supporting the production of high-quality LCD, OLED, and next-generation display panels.
Partner with Alfa Chemistry
As the electronics industry continues to advance toward smaller, faster, and more sophisticated devices, effective cleaning technologies are essential for manufacturing success. Alfa Chemistry is dedicated to providing reliable, high-quality cleaner solutions that support the demanding requirements of IC and FPD production. Whether you need standard products or customized cleaning solutions, we are here to help. Contact us today to learn more about our capabilities and products.
