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Silicate Glass Coating

Silicate Glass Coating

Boro-phospho-silicate Glass (BPSG), as the first layer of pre-metal dielectric (PMD) and inter-metal dielectric (IMD), has a wide range of applications in IC manufacturing. Due to the addition of boron-phosphorus impurities (B2O3, P2O5), it has a certain degree of fluidity like liquid under high temperature conditions. Therefore, the BPSG film has excellent hole filling ability, and can improve the planarization of the entire silicon wafer surface, thereby providing a larger process range for photolithography and subsequent processes. Alfa Chemistry is capable of preparing BPSG films on various wafers. Please contact us for more service information.

Alfa Chemistry's Available Silicate Glass Coatings

Borophosphosilicate Glass - BPSG

BPSG is a coating made of a mixture of oxygen and hydride of silicon (silane: SiH4), boron (diborane: B2H6) and phosphorus (phosphine: PH3), also called doped oxide film. It is similar to silica, with boron and phosphorus added to change its thermal properties. The addition of hydride greatly reduces the melting point of the glass, which makes this process meaningful when a wafer has limited thermal capabilities.

Undoped Silicate Glass - USG

Alfa Chemistry can also provide USG coating services on wafers. The properties of undoped silicate glass are similar to those of silicon dioxide and have a high deposition rate at low temperatures. Therefore, it can be easily deposited by plasma enhanced CVD (PECVD), HDP-CVD or SACVD. Silicate glass is most commonly used as an insulating layer and passivation layer in multilayer IMD applications.

Alfa Chemistry's Methods

Alfa Chemistry uses the following two methods to prepare BPSG films:

Plasma Enhanced Chemical Vapor Deposition (PECVD)

PECVD is a low temperature, high film density deposition technology. The energy from free electrons decomposes the reactive gas and forms a thin film on the wafer surface. The process of growing thin films by PECVD is as follows:

Subatmospheric Pressure Chemical Vapor Deposition (SACVD)

Subatmospheric Pressure Chemical Vapor Deposition (SACVD)

  • SACVD occurs below standard room temperature and uses ozone (O3) to help catalyze the reaction.
  • Although the PE-BPSG film has a series of advantages such as fast deposition speed, dense film, and good uniformity, the SA-BPSG film has a superior hole filling ability.
  • SACVD is a thermal degradation process and does not use plasma generated by radio frequency, thus avoiding device damage caused by plasma.
  • BPSG film is mainly prepared by the SACVD method.

Why Us?

Alfa Chemistry provides customers with detailed technical reports:

  • Experimental procedure
  • Relevant instrument parameters
  • Raw data

All you have to do is place an order and send a sample. Our one-stop service will help you complete the whole project: sample processing-coating preparation-data analysis-project report.

Our products and services are for research use only and cannot be used for any clinical purpose.

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