Polyurethane Polishing Pad is a critical consumable in chemical mechanical polishing (CMP) and precision surface finishing processes, widely used in semiconductor manufacturing, optical fabrication, and advanced ceramic processing. This polishing pad is typically fabricated from high-quality polyurethane foam, and can be further engineered with functional fillers such as cerium oxide or zirconia to meet different polishing requirements. Alfa Chemistry has extensive experience in the field of precision polishing and is capable of providing customers with high-quality polyurethane polishing pads to ensure stable polishing performance and reliable surface finishing results.
Advanced Material Structure
The unique structure of polyurethane polishing pads is the foundation of their excellent performance. The interconnected porous network enables effective slurry absorption and controlled release during polishing, maintaining a consistent interface between the pad, slurry, and workpiece. This structure not only enhances polishing efficiency but also ensures uniform contact pressure distribution across the surface. As a result, it significantly improves process stability and reduces variations in material removal rates, which is critical for high-precision applications.
Product Advantages
01
- Superior Polishing Performance
In CMP processes, Polyurethane Polishing Pads deliver highly controlled material removal while minimizing surface defects such as scratches, micro-dishing, and surface haze. Their mechanical compliance allows them to adapt to slight surface variations, ensuring uniform planarization across large substrates. When paired with optimized polishing slurries, the pads enable nanometer-level surface roughness and excellent flatness, meeting the stringent requirements of advanced semiconductor wafers and optical components.
02
- Durability and Cost Efficiency
Another key advantage of polyurethane polishing pads is their excellent durability. Designed to withstand continuous mechanical stress and chemical exposure, they maintain stable performance over extended operational cycles. This reduces pad replacement frequency, improves production efficiency, and lowers overall manufacturing costs. In addition, their customizable hardness, density, and surface texture allow manufacturers to optimize performance for specific process requirements, further enhancing cost-effectiveness.
Product Specifications
Below are the detailed product specifications, including key parameters such as hardness, density, and filler composition, which can help you better evaluate and select the most suitable polyurethane polishing pad for your specific application requirements.
| Catalog Number | Hardness (LX-A) | Density (g/cm3) | Filler | Application Areas |
| ACSEM-CMP-0083 | 80 | 0.42 | CeO2 | Precision optics, precision ceramics |
| ACSEM-CMP-0084 | 85 | 0.43 | CeO2 | Glass wafers, LCDs |
| ACSEM-CMP-0085 | 85 | 0.43 | CeO2 | Sapphire substrates, optical windows |
| ACSEM-CMP-0086 | 66 | 0.35 | CeO2 | Optical filters, optical communication products |
| ACSEM-CMP-0087 | 90 | 0.59 | ZrO2 | Precision metals, photomasks |
| ACSEM-CMP-0088 | 88 | 0.57 | ZrO2 | Optical glass, infrared crystals |
| ACSEM-CMP-0089 | 88 | 0.51 | None | Quartz, semiconductors |
| ACSEM-CMP-0090 | 92 | 0.58 | None | Sapphire |
| ACSEM-CMP-0091 | 90 | 0.63 | CeO2 | Glass balls |
Product Dimensions
We offer polyurethane polishing pads in a variety of sizes for your selection.
| Round Dimensions (mm) | Square Dimensions (mm) |
| 380 | 1050 | 590*1400 |
| 590 | 1180 | 650*1400 |
| 640 | 1340 | 700*1400 |
| 820 | 1405 | 1000*1400 |
| 960 | 1500 | 1200*1400 |
| Thickness Range (mm) |
| 0.5-3.5 |
Choose Alfa Chemistry
As a professional supplier of advanced polishing materials, Alfa Chemistry focuses on delivering high-performance solutions tailored to precision manufacturing needs. Our polyurethane polishing pads are developed with strict control over foam structure and material formulation, ensuring consistent performance in demanding polishing environments. By offering multiple filling options, we enable flexible adaptation to different abrasive systems and process requirements. If you have any requirements, please don't hesitate to contact us.
