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CVD and ALD Precursors
CVD and ALD Precursors Packaged for Deposition Systems

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CVD and ALD Precursors Packaged for Deposition Systems

Chromium(0) hexacarbonyl

CAS Number: 13007-92-6

Molecular Weight: 220.06

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Tungsten hexacarbonyl

CAS Number: 14040-11-0

Molecular Weight: 351.9

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Tris(tert-butoxy)silanol

CAS Number: 18166-43-3

Molecular Weight: 264.43

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Tetrakis(dimethylamido)zirconium(IV)

CAS Number: 19756-04-8

Molecular Weight: 267.53

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Zirconium(IV) tert-butoxide

CAS Number: 2081-12-1

Molecular Weight: 387.71

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Tris(diethylamido)(tert-butylimido)niobium(V)

CAS Number: 210363-27-2

Molecular Weight: 380.41

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Hafnium(IV) tert-butoxide

CAS Number: 2172-02-3

Molecular Weight: 470.94

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2,4,6,8-Tetramethylcyclotetrasiloxane

CAS Number: 2370-88-9

Molecular Weight: 236.48

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Niobium(V) ethoxide

CAS Number: 3236-82-6

Molecular Weight: 318.21

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Tris[N,N-bis(trimethylsilyl)amide]yttrium

CAS Number: 41836-28-6

Molecular Weight: 570.1

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Vanadium(V) oxytriisopropoxide

CAS Number: 5588-84-1

Molecular Weight: 244.2

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Tantalum(V) ethoxide

CAS Number: 6074-84-6

Molecular Weight: 406.25

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