Alfa Chemistry provides our customers with MEMS lithography solutions. The requirements for the design and function of the chip are different, and the lithography requirements for MEMS, biomedical and optical equipment may be very different. MEMS and biomedical equipment may need to be larger than the field size that standard lithography stepping equipment can support. On the other hand, compared to contact aligners, optical devices may require smaller geometries and narrower line widths.
Please contact us to learn about our lithography capabilities and determine if they are suitable for your project.
Alfa Chemistry is your ideal lithography manufacturing partner.
Fig.1 MEMS lithography and micromachining techniques. (Hines D. R, et al. 2011)
Alfa Chemistry has a professional photolithography lift-off process and deposition technology. We can combine lithography and deposition technology into one process module, thereby completely eliminating the etching process while achieving the same result.
Alfa Chemistry's MEMS laboratory supports the fabrication of devices on 100 mm, 150 mm, and 200 mm silicon wafers and can accommodate non-standard materials such as sapphire, quartz, and ceramics. We can perform all stripping and etching processes on silicon wafers up to 200mm in diameter.
Projection Alignment | 0.8 um Resolution |
Field Step Size 15 mm x 15 mm | |
5x Reduction Stepper | |
Contact Alignment | 5 um Resolution |
Front-To-Back Alignment Capability | |
Spin/Spray Coating | Lift-Off resist |
Positive Resist | |
Negative Resist | |
Polyimide, Standard, and Photo-Definable |
Reference
If you do not find the product or would like to request a quote, please contact us.