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Lithography of MEMS and Biomedical Device

Lithography of MEMS and Biomedical Device

Alfa Chemistry provides our customers with MEMS lithography solutions. The requirements for the design and function of the chip are different, and the lithography requirements for MEMS, biomedical and optical equipment may be very different. MEMS and biomedical equipment may need to be larger than the field size that standard lithography stepping equipment can support. On the other hand, compared to contact aligners, optical devices may require smaller geometries and narrower line widths.

Please contact us to learn about our lithography capabilities and determine if they are suitable for your project.

Selecting a Photolithography Manufacturing Partner

Alfa Chemistry is your ideal lithography manufacturing partner.

  • We have I-Line stepper lithography equipment and contact lithography equipment with a front-to-back alignment function.
  • Our front and rear contact aligners provide unique advantages for MEMS device customers by patterning the features on the back of the substrate and aligning them perfectly with the front features of the substrate.

Lithography of MEMS and Biomedical DeviceFig.1 MEMS lithography and micromachining techniques. (Hines D. R, et al. 2011)

Our Solution

Alfa Chemistry has a professional photolithography lift-off process and deposition technology. We can combine lithography and deposition technology into one process module, thereby completely eliminating the etching process while achieving the same result.

Alfa Chemistry's MEMS laboratory supports the fabrication of devices on 100 mm, 150 mm, and 200 mm silicon wafers and can accommodate non-standard materials such as sapphire, quartz, and ceramics. We can perform all stripping and etching processes on silicon wafers up to 200mm in diameter.

Projection Alignment0.8 um Resolution
Field Step Size 15 mm x 15 mm
5x Reduction Stepper
Contact Alignment5 um Resolution
Front-To-Back Alignment Capability
Spin/Spray CoatingLift-Off resist
Positive Resist
Negative Resist
Polyimide, Standard, and Photo-Definable

Reference

  1. Hines D. R, et al. (2011). "MEMS Lithography and Micromachining Techniques." MEMS Materials and Processes Handbook. 667-753.

Our products and services are for research use only and cannot be used for any clinical purpose.

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