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Alfa Chemistry provides a variety of photoresists for front-end sub-micron lithography and nano-lithography processes to customers who need them. If you are interested in our products, please click here.
These photoresists are used in semiconductor equipment manufacturing and optoelectronics, for terminal devices such as smartphones and tablet computers, as well as applications in the Internet of Things and autonomous driving technologies.
Alfa Chemistry is a leading supplier of semiconductor solutions with extensive experience. We consider the health and safety of our customers because we provide sustainable materials produced in an environmentally friendly way.
The photoresist is the basic material related to photolithography, which is light-sensitive materials, composed of a polymer, a sensitizer, and a solvent.
The photoresist is a light-sensitive coating that is used on the substrate of the structure-sapphire or silicon wafer. These structures are created by irradiating photoresist and then react to light. The photoresist is located in the areas exposed to light and disappears in the areas not exposed to light during development.
Fig.1 The negative photoresist and the positive photoresist are exposed throughout the mask. The results of the two cases are complementary.
Alfa Chemistry provides a variety of photoresist products for semiconductor device manufacturing and optoelectronics in the photolithography process, such as negative resistance and photoacid generators. Our products are rich and diverse, including but not limited to the following:
| Negative photoresist | Negative resist developer | Negative resist remover |
| Diphenyliodonium nitrate | Diphenyliodonium triflate | Diphenyliodonium hexafluorophosphate |
| Boc-methoxyphenyldiphenylsulfonium triflate | (4-tert-Butylphenyl)diphenylsulfonium triflate | (4-Fluorophenyl)diphenylsulfonium triflate |
In the meantime, Alfa Chemistry also provides customers with various lithography monomers for semiconductor lithography technology, such as alicyclic/etch-Resistant Monomers and fluorine-containing monomers for 157 nm UV lithography resist polymers. Our products include, but are not limited to, the following:
| 1,3-Adamantanediacetic acid | 4,4’-(1,3-Adamantanediyl)diphenol | 7-tert-Butoxy-2,5-norbornadiene |
| Dimethyl 1,3-adamantanedicarboxylate | Glycidyl 2,2,3,3-tetrafluoropropyl ether | 2,2,3,4,4,4-Hexafluorobutyl acrylate |
| 2,2,3,4,4,4-Hexafluorobutyl methacrylate | 1,1,1,3,3,3-Hexafluoroisopropyl acrylate | 1,3-Adamantanedicarboxylic acid |
We are a leading supplier of photoresist products, which has led to long-term partnerships with many clients and organizations. We offer a wide range of pattern materials in our product portfolio.
The benefits of working with us are self-evident:
If you do not find the product or would like to request a quote, please contact us.
