The defects on the mask are reflected on the wafer. As the complexity of the chip increases, the difficulty of detecting errors also increases. Defects are unwanted deviations in chips, which can impact yield and performance. They can crop up during the chip manufacturing process, including the production of a mask or photomask, sometimes called a reticle.
Alfa Chemistry is a technological leader in the field of photomasks, providing customers with cost-effective mask defect inspection services to capture statistical defects.
Our services are used in wafer manufacturing, photomask manufacturing, MEMS and LED manufacturing, and research institutions. Our services have the following significant advantages:
A hard defect is any flaw affecting the photomask mask, other than contamination. One class of defects includes the presence of metallized coating where it should not be or unwanted clear areas (pin holes, clear breaks, clear extensions). Such defects may cause the circuit to fail to operate normally.
Soft defects include dust, particles and residual photoresist.
The causes are as follows:
The existence of defects does not necessarily affect the function of the circuit, but the designer/end user may determine that this is unacceptable.
Cosmetic defects can include:
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