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Chemical mechanical polishing (CMP) pads are another critical consumable in the CMP process. CMP pads consists of porous and elastic polymer materials. They have sponge-like mechanical and porous properties, and have special grooves on their surface to improve polishing uniformity. The main function of CMP pads is to store and transport CMP slurries, remove abrasives and maintain a stable polishing environment for uniform polishing.
Fig 1. Working principle of CMP pads.
Alfa Chemistry provides CMP pads, including but not limited to the following products.
Polyurethane CMP Pads
Non-woven Fabric
CMP Pads
Composite CMP Pads
Alfa Chemistry has been developing CMP pads through close alignment with our customers’ performance targets, and by using our own technologies, abundant experience, and the utmost safety and environmental awareness. We are confident that our CMP pads will contribute to your research.
Depending on your requirements for size, thickness, material and hardness of CMP pads, Alfa Chemistry provides you with CMP pads custom services. We are committed:
Please contact us if you have any questions about CMP pads. We will provide you with professional and quality services.
If you do not find the product or would like to request a quote, please contact us.
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