Etchants can selectively and uniformly remove substrates without damaging underlying film and mask, which is critical to wafer manufacturing. The selection of etchants usually based on the material characteristics of etch target film, underlying film and mask. A suitable etchant can reduce the special defects of products.
Alfa Chemistry offers you highly skilled technical support staff available to answer your question as well as assist you in selecting and customizing synthesis the appropriate etchants. Our etchants ranges from mainstream etchants to the development and manufacture of unique etchants for customer-specific applications. Whether you have questions about specifications, testing, product performance, or application of etchants, please contact us, we will provide you with professional services.
Alfa Chemistry is a quality supplier of etchants that can help customers select optimal etchant according to the materials and properties of different thin films. In addition, with a professional synthesis team, we can provides custom synthesis services for a variety of etchants.
Alfa Chemistry mainly provides etchant selection and custom synthesis services for the following thin film layers, if you need, please contact us.
Indium oxide (In2O3)
Tin oxide (SnO2)
Molybdenum oxide (MoO3)
Silicon nitride (Si3N4)
Silicon dioxide (SiO2)
If you do not find the product or would like to request a quote, please contact us.