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Deposition Materials

Metal-organic precursors help create the basic building blocks of electronic chips. Each layer is gradually added to a special evaporation chamber or epitaxial chamber. When the precursor contacts the heated wafer, they leave deposits and form semiconductors. The vapor phase reactant (chemical precursor) deposits/grows a thin film on the substrate by chemical vapor deposition (CVD) or atomic layer deposition (ALD).

Alfa Chemistry is a leading supplier of semiconductor solutions with extensive experience. We can provide our customers with a variety of deposition materials, which are chemistries enabling thin film CVD and ALD of metals, oxides, and nitrides for the next gen advanced logic and memory devices.

What Are CVD and ALD?

CVD: A chemical process often used in semiconductor chip manufacturing to deposit thin films of various materials

  • Continuous film growth
  • Gas mixed in the reaction chamber
  • The thickness is controlled by the reaction time (the ability to grow very thin films is limited)

ALD: Thin film deposition technology based on the sequential use of gas-phase chemical processes (a sub-category of chemical vapor deposition)

  • Self-terminating
  • Conformal film
  • Reactive gas introduced separately
  • Thickness control by the number of cycles (excellent film thickness control)

Deposition Materials

What Can We Offer?

Alfa Chemistry uses advanced chemistry and process technology in precursor materials for the semiconductor industry and LED lighting applications. Our extensive portfolio of high-purity metals and dielectric precursor materials can support front-end and back-end production line applications, such as the laboratory-scale molecular design in research and development.

We provide high-quality purified CVD and ALD application precursors that can be used in semiconductor and thin-film research and development. Volatile precursors suitable for various CVD applications include metal and ceramic thin and thick films. The products are listed by the main deposition element atoms, from aluminum to zirconium. If you are interested in our products, please click here.

Our portfolio comprises, but is not limited to, the following:

CarbonCarbon Tetrabromide
Carbon Trichlorobromide
Carbon Trichlorobromide
AluminiumDiethylaluminum Ethoxide
Trimethylaluminium
Triethylaluminum
CobaltBis(1,4-di-tert-butyldiazadienyl)cobalt
Tertiarybutylacetylenedicobalthexacarbonyl
Tertiarybutylallylcobalt tricarbonyl
SiliconBis(dimethylamino)silane
Tris(dimethylamino)silane
N,N'-di-tert-butylsilanediamine
Bis(dimethylamino)methylsilane
Tetravinylsilane
Tetramethyldisiloxane
TantalumPentakis(dimethylamino)tantalum
Tris(ethylmethylamido)(tert-butylimido)tantalum
Tanttalumethoxide
Tris(ethylmethylamido)(tert-butylimido)tantalum
TitaniumTitanium Tetrachloride
Tetrakis(dimethylamino)titanium

Benefits of Working with Us

We are a leading supplier of deposition products, which has led to long-term partnerships with many clients and organizations. We provide a variety of containers for you to choose from to ensure 100% reliable material transfer. Our excellent logistics system can also ensure that the pure materials are delivered safely every time.

The benefits of working with us are self-evident:

  • World-class purity and ultimate quality
  • Highly reliable batch-to-batch consistency
  • Guarantee of global and regional support

Deposition Materials

Our products and services are for research use only and cannot be used for any clinical purpose.

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