Alfa Chemistry's quality, attention to detail and knowledge of the photomask industry enable us to support the various needs of many customers.
Due to the need for independent resources, Alfa Chemistry provides cost-effective and professional-level computer-aided design (CAD) services for photomasks. We have a group of dedicated CAD staff in our New York office. Our customers range from individuals to large mature semiconductor companies.
We will support you through the complete process from design to photomask.
The focus of Alfa Chemistry is to save customers time and money by providing high-quality services. Our services are very suitable for MEMS, medical, optics, photonics, RF and IR design.
Usually, your design has been completed in some form, such as DXF, Solid Works, Gerber, CIF or GDSII. In order to make your design capable of photomask processing, you need to convert the data to check for errors. Alfa Chemistry has templates for all available steppers, scanners and aligners, and will ensure that your design can be used in the fab.
Startup Companies /R&D / Universities / Government Agencies
Large semiconductor company
If you do not find the product or would like to request a quote, please contact us.