Having a consistent high-quality photomask is one of the key factors in wafer lithography. Combined with a stable exposure and resist process, it can ensure a rapid learning cycle for increased yield and technology development and design evaluation. When using masks in production, it is important to identify defects on all masks, understand their impact on the mask printing performance and eliminate them before using the mask in a stepper or scanner because this can avoid production loss or technical problems caused by mask problems.
Alfa Chemistry provides our customers with photomask quality verification solutions to ensure defect-free photomasks. Our professional capabilities cover almost all lithography technologies, including dual patterning, source mask optimization (SMO) and reverse lithography scanning.
Alfa Chemistry can provide you with a wealth of photomask quality identification solutions, including defect inspection, printability analysis and maintenance verification, and can perform high-precision and high-precision photomask certification for today and future technology nodes. We provide solutions to ensure the defect-free printing performance of photomasks for 248 nm, 193 nm and EUV lithography, while accurately identifying photomasks based on printing behavior.
Fig.1 Mask qualification process flow.
The photomask supports we can provide include, but are not limited to, the following:
If you do not find the product or would like to request a quote, please contact us.