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CVD Diamond Substrates

Chemical vapor deposition (CVD) diamond substrates have emerged as one of the most advanced materials used in modern high-performance technologies. Produced through a controlled vapor-phase growth process, these substrates exhibit exceptional purity, structural uniformity, and material stability. Their outstanding mechanical, thermal, and electronic properties make CVD diamond a preferred choice in cutting-edge applications where conventional materials such as silicon, sapphire, or GaAs reach their performance limits.

Outstanding Material Properties

One of the most defining features of CVD diamond substrates is their ultra-wide bandgap—approximately 5.5 eV—which supports high breakdown voltages and robust operation under high electric fields. This characteristic allows devices built on diamond substrates to function efficiently in environments where conventional semiconductors like silicon face limitations. Additionally, CVD diamond exhibits the highest known thermal conductivity among solid materials, enabling rapid heat dissipation and significantly reducing the risk of thermal damage in high-power applications. Its exceptional mechanical strength, radiation hardness, and chemical stability further enhance device reliability, especially in harsh conditions such as high temperature, high radiation, or corrosive environments.

Key Applications Across Industries

Due to their exceptional performance, CVD diamond substrates are gaining traction in numerous advanced technology fields. In high-power electronics, they serve as promising candidates for Schottky diodes, field-effect transistors, and power amplifiers capable of operating under extreme thermal and electrical stress. In photonics and optical engineering, CVD diamond is used in Raman lasers, UV optics, and quantum photonic devices due to its wide transparency range and low optical absorption. The material is also valuable in sensors and detectors, particularly for radiation detection in medical imaging, space exploration, and nuclear monitoring. Additionally, its robust properties make it ideal for thermal spreaders and heat-sinking components in high-density semiconductor modules.

Our Products

The various performance characteristics of diamond substrates are shown in the table below:

PropertyValue
Crystal StructureCubic crystal
Band Gap5.47 eV
Melting Point4027 °C
Mohs Hardness10
Thermal Expansion Coefficient0.8 × 10-6 °C-1
Lattice Constant0.3567 nm
Electron Mobility1600 cm2/v·s
Breakdown Electric Field10 MV·cm-1
JFM Index (Power)5330
BFM Index (SW)14860
BHFM Index (RF)1080
Refractive Index2.417

The available specifications of CVD diamond substrates we can offer are as follows:

Product TypeSingle-Crystal Diamond SubstratePolycrystalline Diamond Substrate
Catalog NumberACSEM-WS-0048ACSEM-WS-0049ACSEM-WS-0050ACSEM-WS-0051ACSEM-WS-0052ACSEM-WS-0053ACSEM-WS-0054ACSEM-WS-0055
Diameter5*5 mm10*10 mm20*20 mm25.4±0.3 mm10*10 mm20*20 mm25.4±0.3 mm50.8±0.5 mm
Thickness300-500 μm
Growth MethodMPCVD
Surface FinishGrind, SSP, DSP
Polish Roughness (AFM, 5*5 μm)1-10 nm
Thermal Conductivity1500-2300 W/m.K1000-2000 W/m.K

* If the specifications you need are not available in the table, we can also offer customized services for you.


Alfa Chemistry provides high-quality CVD diamond substrates designed to meet the demanding needs of advanced research and industrial applications. With options available in various diameters, thicknesses, and surface finishes, customers can select substrates tailored to their exact technical requirements. If you are interested in purchasing our products, please contact us immediately, and we will provide you with professional guidance and comprehensive support.

Our products and services are for research use only and cannot be used for any clinical purpose.

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