Chemical vapor deposition (CVD) diamond substrates have emerged as one of the most advanced materials used in modern high-performance technologies. Produced through a controlled vapor-phase growth process, these substrates exhibit exceptional purity, structural uniformity, and material stability. Their outstanding mechanical, thermal, and electronic properties make CVD diamond a preferred choice in cutting-edge applications where conventional materials such as silicon, sapphire, or GaAs reach their performance limits.
One of the most defining features of CVD diamond substrates is their ultra-wide bandgap—approximately 5.5 eV—which supports high breakdown voltages and robust operation under high electric fields. This characteristic allows devices built on diamond substrates to function efficiently in environments where conventional semiconductors like silicon face limitations. Additionally, CVD diamond exhibits the highest known thermal conductivity among solid materials, enabling rapid heat dissipation and significantly reducing the risk of thermal damage in high-power applications. Its exceptional mechanical strength, radiation hardness, and chemical stability further enhance device reliability, especially in harsh conditions such as high temperature, high radiation, or corrosive environments.
Due to their exceptional performance, CVD diamond substrates are gaining traction in numerous advanced technology fields. In high-power electronics, they serve as promising candidates for Schottky diodes, field-effect transistors, and power amplifiers capable of operating under extreme thermal and electrical stress. In photonics and optical engineering, CVD diamond is used in Raman lasers, UV optics, and quantum photonic devices due to its wide transparency range and low optical absorption. The material is also valuable in sensors and detectors, particularly for radiation detection in medical imaging, space exploration, and nuclear monitoring. Additionally, its robust properties make it ideal for thermal spreaders and heat-sinking components in high-density semiconductor modules.
The various performance characteristics of diamond substrates are shown in the table below:
| Property | Value |
| Crystal Structure | Cubic crystal |
| Band Gap | 5.47 eV |
| Melting Point | 4027 °C |
| Mohs Hardness | 10 |
| Thermal Expansion Coefficient | 0.8 × 10-6 °C-1 |
| Lattice Constant | 0.3567 nm |
| Electron Mobility | 1600 cm2/v·s |
| Breakdown Electric Field | 10 MV·cm-1 |
| JFM Index (Power) | 5330 |
| BFM Index (SW) | 14860 |
| BHFM Index (RF) | 1080 |
| Refractive Index | 2.417 |
The available specifications of CVD diamond substrates we can offer are as follows:
| Product Type | Single-Crystal Diamond Substrate | Polycrystalline Diamond Substrate | ||||||
| Catalog Number | ACSEM-WS-0048 | ACSEM-WS-0049 | ACSEM-WS-0050 | ACSEM-WS-0051 | ACSEM-WS-0052 | ACSEM-WS-0053 | ACSEM-WS-0054 | ACSEM-WS-0055 |
| Diameter | 5*5 mm | 10*10 mm | 20*20 mm | 25.4±0.3 mm | 10*10 mm | 20*20 mm | 25.4±0.3 mm | 50.8±0.5 mm |
| Thickness | 300-500 μm | |||||||
| Growth Method | MPCVD | |||||||
| Surface Finish | Grind, SSP, DSP | |||||||
| Polish Roughness (AFM, 5*5 μm) | 1-10 nm | |||||||
| Thermal Conductivity | 1500-2300 W/m.K | 1000-2000 W/m.K | ||||||
* If the specifications you need are not available in the table, we can also offer customized services for you.
Alfa Chemistry provides high-quality CVD diamond substrates designed to meet the demanding needs of advanced research and industrial applications. With options available in various diameters, thicknesses, and surface finishes, customers can select substrates tailored to their exact technical requirements. If you are interested in purchasing our products, please contact us immediately, and we will provide you with professional guidance and comprehensive support.
If you do not find the product or would like to request a quote, please contact us.