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Thin Films for MEMS, Biomedical and Optical Device Fabrication

Biomedical and Optical Device Fabrication

Semiconductor thin films are an important part of any microelectronics manufacturing process. Having flexible and diversified "thin-film tools" can greatly improve equipment functions and manufacturability.

The mechanical properties of the membrane can determine the feasibility of the MEMS device. For optical devices, a multilayer film stack with the correct refractive index is extremely important. For many biomedical devices, the gold, platinum, and silver layers are critical to the function of the device.

Alfa Chemistry provides thin-film support for MEMS solutions. We can offer customers the most comprehensive and diverse thin-film products on the market.

What Can We Offer?

Alfa Chemistry provides our customers with diverse wafer films. Many of our films can be customized to meet the specific refractive index, film stress, resistivity, and crystallinity requirements of the manufactured equipment. Please contact us for any special requirements.

All of our films can be used on wafers up to 200 mm. Sputtering and PECVD films can be used for wafers up to 300 mm. To support the growing customer base, Alfa Chemistry will continue to add new film products to our product portfolio.

Our portfolio comprises, but are not limited to, the following:

Dry Chlorinated Thermal Oxide100mm Silicon Wafers 3000A Dry Chlorinated Thermal Oxide & Forming Gas Anneal
Dry Thermal OxideDiethylaluminum Ethoxide
Trimethylaluminium
Triethylaluminum
Cobalt100mm Silicon Wafers 3000A Dry Thermal Oxide
150mm Silicon Wafers 1000A Dry Thermal Oxide
Wet Thermal Oxide100mm Silicon Wafers 1000A Wet Thermal Oxide
100mm Silicon Wafers 10000A Wet Thermal Oxide
100mm Silicon Wafers 2000A Wet Thermal Oxide
100mm Silicon Wafers 60000A Wet Thermal Oxide
150mm Silicon Wafers 60000A Wet Thermal Oxide
76mm Silicon Wafers 15000A Wet Thermal Oxide
Low Stress LPCVD Nitride100mm Silicon Wafers 3000A Low Stress LPCVD Nitride
100mm Silicon Wafers 6000A Low Stress LPCVD Nitride
Stoichiometric LPCVD Nitride150mm Silicon Wafers 2000A Stoichiometric LPCVD Nitride

The film services (Click here to learn more) we can provide include, but are not limited to, the following:

PECVD Deposition

  • Silica
  • Silicon nitride
  • Low stress silicon nitride
  • Silicon carbide
  • Silicon oxynitride
  • Carbon doped oxide
  • Amorphous silicon

Thermal Oxidation

  • Damp heat annealing
  • Dry heat oxidation
  • Dry chlorination thermal oxidation

Sputter Deposition

  • Aluminum
  • Copper
  • Nickel
  • Chromium
  • Tantalum
  • Titanium
  • Tungsten
  • Reactive sputtering titanium nitride
  • Reactive sputtering tantalum nitride
  • Reactive sputtering tantalum oxide

Electron Beam Deposition

  • Aluminum
  • Copper
  • Nickel
  • Chromium
  • Gold
  • Indium tin oxide
  • Silver
  • Titanium
  • Platinum
  • Platinum iridium
  • Alumina

Biomedical and Optical Device Fabrication

Our products and services are for research use only and cannot be used for any clinical purpose.

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