Quartz substrates for photomasks are critical materials in semiconductor manufacturing and advanced photonic technologies, providing the foundation for precise pattern transfer and optical processing. As device structures become increasingly complex and manufacturing tolerances continue to tighten, the demand for quartz substrates with high purity, excellent optical uniformity, and superior dimensional stability has grown significantly.
These substrates are widely used in applications such as through-glass via (TGV), diffractive optical element (DOE), planar lightwave circuit (PLC), arrayed waveguide grating (AWG), and other precision optical and microfabrication technologies. To meet the stringent requirements of these applications, quartz substrates must offer excellent surface smoothness, bubble-free internal structures, stable optical performance, and consistent processing quality, helping ensure reliable lithography accuracy and device performance.
Our Capabilities
At Alfa Chemistry, we provide high-quality quartz substrates for photomask applications, supporting the demanding requirements of semiconductor manufacturing, optical communication, and microfabrication technologies. Our quartz substrates are engineered for excellent optical consistency, dimensional stability, and surface quality. With extremely low metal impurity content and outstanding refractive index uniformity, they are suitable for applications that require high precision and reliable light transmission performance. In addition, the bubble-free structure and excellent surface smoothness help ensure superior lithography and optical processing results.
Specification Parameters
Optical Properties
| Model | Catalog Number | OH (ppm) | Stress Birefringence (nm/cm) | Striae Grade | Transmittance | Internal Transmittance | Features |
| QSP-01 | ACSEM-QSP-0001 | <250 | <10 | 1D | >90.2%@365nm | >99.8%@193/248/365nm | Suitable for i-line and g-line |
| ACSEM-QSP-0002 | <250 | <2 | 1D | >90.2%@248nm | >99.8%@193/248/365nm | Suitable for KrF |
| ACSEM-QSP-0003 | <50 | <1 | 3D | >90.2%@193nm | >99.8%@193/248/365nm | Suitable for ArF |
Surface Roughness Test (10 μm*10 μm)
| Grade | I-line | KrF | ArF |
| Flatness (μm) | Front | ≤2 | ≤1 | ≤0.5 |
| Back | ≤3 | ≤2 | ≤1 |
| Total Thickness Variation (TTV) (μm) | ≤2 | ≤2 | ≤1 |
| RMS Roughness (nm) | Front/Back | ≤0.2 | ≤0.2 | ≤0.15 |
Processing and Inspection
Alfa Chemistry provides comprehensive processing and inspection services for quartz substrates used in semiconductor mask plates, supported by advanced manufacturing equipment, precision machining technologies, and strict quality control procedures to meet the demanding requirements of semiconductor applications. Our capabilities are as follows:
- Multi-wire cutting for high-efficiency and high-precision material slicing
- CNC precision machining for complex structures and accurate dimensional control
- Double-side grinding and polishing to achieve excellent flatness and surface quality
- Ultrasonic cleaning and deep cleaning for effective particle and contamination removal
- Defect inspection to ensure reliable quality and compliance with semiconductor industry standards
Choose Alfa Chemistry
Choosing Alfa Chemistry means partnering with a company committed to quality, precision, and technical innovation. Our team works closely with customers to understand their technical requirements and deliver customized quartz substrate solutions tailored to specific applications. From material preparation to precision processing and quality inspection, every step is carefully controlled to ensure consistent performance and dependable results.
Whether you require standard quartz substrates or customized solutions for advanced photomask and photonics applications, Alfa Chemistry is ready to support your project with high-quality materials and responsive technical service. We look forward to establishing a long-term and stable partnership with you to jointly advance the development of advanced semiconductor and photonic technologies.
