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High Purity Chemicals Analysis

In the semiconductor manufacturing process, ultra-pure chemicals are used to clean the products. To prevent contamination, these chemicals must not contain any trace metals. ppt-level pollutants can cause corrosion, erosion, electromigration, and device short circuits in wafers or electronic components. Therefore, quality control in the industry chain includes the analysis of chemicals and reagents in the process, such as ultra-pure water, high-purity reagents, and light. Resist, specific organic additives, transition metals, trace elements in electroplating baths, inorganic anions and cations, polyvalent ions and organic complexing agents, etc.

High Purity Reagent AnalysisFig.1 The process flow involved in semiconductor materials (the red part is the application link of wet electronic chemicals).

With the industry's leading analytical technology and professional research team, Alfa Chemistry provides reliable testing solutions that can ensure sensitive and accurate analysis of chemicals under the most challenging sample conditions. We have analytical instruments with excellent sensitivity, and these instruments must be able to operate effectively in a highly matrix environment.

We can provide you with the following solutions:

  • Analysis of trace element impurities, anions and cations in high purity reagents
  • Online monitoring of trace element impurity concentration in high-purity reagents
  • Offline analysis and online monitoring of trace anions and cations in ultrapure water

Ensure the purity of the semiconductor process chemicals

Our stable and reliable analysis technology can ensure sensitive and accurate analysis of chemical reagents under various sample conditions. Among them, ICP-MS ORS and ICP-MS/MS technology can realize the direct measurement of process chemicals, and can effectively reduce the interference of mass spectrometry.

High Purity Reagent Analysis Fig.2 A clear description of operating principles of ICP-MS/MS. (Balcaen L, et al. 2015)

The analysis cases we provide include, but are not limited to the following:

  • Analysis of multi-element nanoparticle


Analyzing the presence of NP in chemical raw materials is very important. If there are particles between the two metal lines, it may cause a short circuit, and surface defects will affect the growth of the new material layer on the silicon wafer.

Detection method:

Using single-particle inductively coupled plasma mass spectrometry can directly measure the nanoparticles in the sample solution.

  • Analysis of Trace Metal Impurities in High Purity Nitric Acid


HNO3 plays an important role in the manufacture of semiconductor devices, so ultra-high purity is required. HNO3 is also mixed with phosphoric acid and acetic acid for the wet etching of aluminum. It can also be used as a reagent to prepare other semiconductor materials.

SEMI standard:

The HNO3 (69.0%-70.0%) SEMI standard C35-0708 Class B program stipulates that the pollutant concentration of several elements should be<1 µg/L (ppb)

Detection method:

Direct analysis of undiluted HNO3 using tandem quadrupole ICP-MS/MS. This method can simplify sample preparation and avoid the introduction of contaminants during the dilution process.

Please contact us to learn more information.


  1. Balcaen L, et al. (2015). "Inductively Coupled Plasma - Tandem Mass Spectrometry (ICP-MS/MS): A Powerful and Universal Tool for The Interference-free Determination of (Ultra) Trace Elements - A Tutorial Review." Analytica Chimica Acta. 894(24): 7-19.

Our products and services are for research use only and cannot be used for any clinical purpose.

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