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Implant

Implant

Wafer implantation, also called "ion implantation", is a process that uses elemental ions to change the physical, chemical, or electrical properties of a target. Wafer implantation originated in the 1940s. However, it is most common in the semiconductor industry today. During the wafer implantation process, the ions are accelerated in the electric field to produce a beam emitted at the wafer. Ion implantation allows very precise quantification, which can make the position and depth of the particles on the target wafer more precise.

Alfa Chemistry provides wafer implant services for silicon, silicon-on-insulator (SOI) and other types of specialty substrates such as GaAs, GaN, InP, and more.

Alfa Chemistry's Wafer Implant Capabilities

Alfa Chemistry is a recognized leader in semiconductor wafer ion implantation. We have a dedicated professional department and expert team to help you at any time. We process unique shapes and wafer sizes ranging from pieces to 300 mm.

  • Wafer diameter: 25 mm to 300 mm
  • Implant energy range: 1 KeV to 3 000 KeV
  • Wafer materials: Si, Si thin wafers / Taiko wafers, SiC, GaN, InP / GaAs, InSb, HgCdTe, LiNbO3, Sapphire / Diamond / Quartz
  • Provide low, medium and high dose implant solutions
  • Implantation can be provided on bare and patterned wafer substrates
  • Small batches of prototypes can be accepted (Implantation is a small batch process and is usually more expensive than other standard services.)
  • The following contains a partial list of species that are regularly implanted:
ProtonsBerylliumNitrogen
HeliumBoronOxygen
LithiumCarbonMagnesium
AluminumPhosphorusGallium
SiliconArgonGermanium

Unique and special ion implantation requests are always welcome. Please contact us to see if we can accommodate your requests.

Alfa Chemistry's Instrument Platforms

Thanks to the years of research experience, Alfa Chemistry is provided with a complete set of tools that can characterize the implanted wafers. Our analysis equipment include, but are not limited to, the following:

Implant Applications

  • Mechanical Profilometer
  • Optical Thickness Measurment
  • Sheet resistance + Prober IBS
  • Micro Auger & XPS
  • Dual Beam FIB & TEM
  • Laser Decapsulation
  • Layers Thicknesses & Morphology
  • Optical 3D Profilometer
  • Micro Raman
  • Atomic Force Microscope (AFM)
  • Scanning Electron Microscope (SEM)

Why Us?

  • Alfa Chemistry has more than 30 years of business experience and has successfully completed thousands of ion implantation tasks. We are one of the most experienced ion implantation service providers.
  • Alfa Chemistry utilizes SIMS standards and has a history of support and implementation for small-scale specialty projects and experimental development of sample prototypes.
  • Alfa Chemistry is experienced in all of your ion implantation requirements. With expert handling of your wafers throughout the implant process, we are committed to perfecting ion implantation.

Our products and services are for research use only and cannot be used for any clinical purpose.

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