Quartz wafers are high-purity quartz substrates widely used in semiconductor manufacturing, photonics, MEMS, and advanced optical applications. Featuring excellent thermal stability, low thermal expansion, high optical transparency, and outstanding chemical resistance, these wafers can maintain reliable performance under demanding processing environments such as high temperatures, plasma exposure, and corrosive chemicals. They are commonly applied in photomasks, wafer carriers, optical windows, microfluidic devices, and precision optical components, where dimensional stability and surface quality are critical for device performance and manufacturing accuracy.
Our Capabilities
At Alfa Chemistry, we provide high-performance quartz wafers manufactured with strict quality standards to support advanced industrial and research applications. Our products feature extremely low metal impurity content, ensuring excellent material purity and reduced contamination risks during processing. In addition, they offer high refractive index uniformity, bubble-free structures, and outstanding surface gloss and smoothness, making them ideal for precision optical fabrication and semiconductor processes that require superior dimensional and optical consistency.
We place strong emphasis on quality control throughout the entire production process. From raw material selection to final inspection, every quartz wafer undergoes rigorous testing to ensure excellent purity, refractive index consistency, and surface smoothness. Our technical expertise allows us to support customers in applications involving through-glass via (TGV), diffractive optical element (DOE), planar lightwave circuit (PLC), arrayed waveguide grating (AWG), and other high-end optical or electronic substrates, helping improve device performance and long-term reliability.
Specification Parameters
Product Parameters
| Model | QW-01 |
| Catalog Number | ACSEM-QW-0001 | ACSEM-QW-0002 | ACSEM-QW-0003 | ACSEM-QW-0004 |
| Size | inch | 4 | 6 | 8 | 12 |
| Thickness (mm) | 0.05~2 | 0.25~5 | 0.3~5 | 0.4~5 |
| Tolerance | Diameter (mm) | ±0.1 | ±0.1 | ±0.1 | ±0.1 |
| Thickness (mm) | Customizable | Customizable | Customizable | Customizable |
| Optical Properties | Refractive Index n@365nm | 1.474698 | 1.474698 | 1.474698 | 1.474698 |
| Refractive Index n@546.1nm | 1.460243 | 1.460243 | 1.460243 | 1.460243 |
| Refractive Index n@1014nm | 1.450423 | 1.450423 | 1.450423 | 1.450423 |
| Internal Transmittance (1250-1650 nm) | >99.9% | >99.9% | >99.9% | >99.9% |
| Transmittance (1250-1650 nm) | >92% | >92% | >92% | >92% |
| Processing Accuracy | Total Thickness Variation (TTV) (μm) | <3 | <3 | <3 | <3 |
| Flatness (μm) | ≤15 | ≤15 | ≤15 | ≤15 |
| Roughness(nm) | ≤1 | ≤1 | ≤1 | ≤1 |
| Bow (μm) | <5 | <5 | <5 | <5 |
| Mechanical Properties | Density(g/cm3) | 2.2 | 2.2 | 2.2 | 2.2 |
| Mohs Hardness | 6~7 | 6~7 | 6~7 | 6~7 |
| Young's Modulus (GPa) | 74.2 | 74.2 | 74.2 | 74.2 |
| Shear Modulus (GPa) | 31.22 | 31.22 | 31.22 | 31.22 |
| Poisson's Ratio | 0.17 | 0.17 | 0.17 | 0.17 |
| Compressive Strength (GPa) | 1.13 | 1.13 | 1.13 | 1.13 |
| Tensile Strength (MPa) | 49 | 49 | 49 | 49 |
| Flexural Strength (MPa) | 94.3 | 94.3 | 94.3 | 94.3 |
| Thermal Properties | Yield Point (η=1014.5dPa·s) | 1000 °C | 1000 °C | 1000 °C | 1000 °C |
| Annealing Point (η=1013dPa·s) | 1160 °C | 1160 °C | 1160 °C | 1160 °C |
| Softening Point (η=107.6dPa·s) | 1620 °C | 1620 °C | 1620 °C | 1620 °C |
Major Impurity Elements and Hydroxyl
| Content (ppm, wt%) | Li | Na | K | Mg | Ca | Cu | Al | Cr | Fe | Ti | Hydroxyl |
| QW-01 | <0.001 | <0.005 | <0.005 | <0.005 | <0.005 | <0.001 | <0.005 | <0.001 | <0.002 | <0.008 | <50 |
Choose Alfa Chemistry
Choosing Alfa Chemistry means gaining access to dependable product performance, professional technical support, and customized solutions tailored to diverse application needs. We continuously strive to support innovation and help our global partners achieve success in advanced technology applications. If you have any needs, please feel free to contact us.
