Silicon Carbide Films

Silicon carbide (SiC) is a crystalline compound composed of silicon and carbon atoms. SiC has the advantages of low thermal expansion, high corrosion resistance, excellent hardness and high thermal conductivity. The inherent properties of SiC make it an important material in the applications of microelectronics and microelectromechanical systems (MEMS). Alfa Chemistry has many years of experience in developing and optimizing SiC films. We can adjust the deposition conditions to provide various SiC films and ideal film stress levels for many MEMS specific applications.

Alfa Chemistry's Deposition Technology

Alfa Chemistry uses physical vapor deposition (PVD) and plasma enhanced chemical vapor deposition (PECVD) to deposit Silicon Carbide (SiC) films.

In a high-temperature vacuum or in a gaseous plasma, the powdered silicon carbide is converted into vapor while performing SiC PVD. After all the materials have been evaporated, they are moved to a partial or full vacuum furnace containing wafers. Once in the furnace, the steam is deposited on the surface of the substrate, forming a thin layer of emery.

Our vapor-deposited silicon carbide is superior to any silicon carbide available today. The outstanding properties of Alfa Chemistry's SiC films include excellent chemical resistance and excellent thermal properties.

Applications of Alfa Chemistry's SiC Films

CVD SiC is often used in RTP and oxide etching chamber components due to the excellent thermal shock resistance of SiC and its resistance to erosion by high-energy plasma. The heating element and base made of low-resistance SiC can improve the uniformity of heating inside the processing chamber. Other ways it may be beneficial to the industry include chambers or linings with improved in-situ cleaning uniformity, sputtering targets, and all types of electrodes. At the same time, CVD silicon carbide can improve space utilization in crowded processing tools. In addition, our low-resistance silicon carbide film is very suitable for susceptors, processing chambers, heaters, electrostatic chucks or any application that requires electrical conductivity, abrasion resistance and thermal shock resistance.

For more information about our SiC Films, please contact us.

Why Us?

• Alfa Chemistry has a group of high-quality, high-tech professional chemical technicians.
• Alfa Chemistry has modern R&D laboratories and analytical instruments.
• Alfa Chemistry laboratory adopts international laboratory management system.
• Alfa Chemistry has established long-term cooperative relationships with many well-known companies and institutions.
• Alfa Chemistry's management team has an international perspective.

Order Process

1. Contact us and make a request.
2. We provide suitable solutions.
3. Sign the contract and mail samples.
4. We provide one-stop service.
5. We provide complete project research and development reports.

Reference

1. Fraga. M, et al. (2020). "Progresses in Synthesis and Application of SiC Films: From CVD to ALD and from MEMS to NEMS." Micromachines. 11, 799.