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Hydrogen peroxide ULSI

Catalog
ACMA00021688
DescriptionHydrogen peroxide is a strong oxidizer. It may be produced industrially by anthraquinone oxidation.It is used in semiconductor industry essentially for cleaning silicon wafers, removal of photoresists and to etch metallic copper on printed circuit boards. Ultrapurification of hydrogen peroxide by reverse osmosis has been reported in detail.
Molecular Weight34
Molecular FormulaH2O2
Boiling Point107 °C
Melting Point-26 °C
ApplicationSemiconductor grade hydrogen peroxide was used to etch TiN and GaAs structures.
StorageRoom temperature
Assay30.5+0.5%
FormLiquid
Quality Level100

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