Zirconium-Nickel Sputtering Target

Purity	99.95%
Application	Zirconium-Nickel (Zr/Ni) Sputtering Targets are widely utilized in various industrial applications due to their exceptional properties. In the sputtering process, these targets are used to create thin films on substrates, leveraging their high purity and uniformity to ensure the production of high-quality coatings. The combination of zirconium and nickel results in a material with excellent corrosion resistance, thermal stability, and a high sputtering rate, making it ideal for the manufacture of magnetic sensors, wear-resistant coatings, and decorative coatings. The addition of zirconium enhances the hardness and oxidation resistance of the deposited films, further improving their durability and performance in demanding environments. This makes Zr/Ni sputtering targets a preferred choice in industries where precision and material resilience are critical.
Composition	Zr/Ni