Hafnium-Iron Sputtering Target

Purity	99.95%
Application	Hafnium-iron sputtering targets are a key material used in semiconductor integrated circuits, primarily in the wafer manufacturing and chip packaging stages of chip production. These targets play an important role in creating the metal wiring that transmits information on semiconductor chips. Under high vacuum conditions, the surface of the hafnium-iron target is bombarded by high-speed ion streams, causing its atoms to deposit on the chip surface. Through specialized processing techniques, the metal film is then etched into nanoscale metal lines, enabling the interconnection of micro transistors within the chip.
Composition	Hf/Fe