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| Purity | 99.99% |
|---|---|
| Application | Aluminum-Iron (Al-Fe) sputtering targets are employed in a range of advanced applications, including semiconductor manufacturing, chemical vapor deposition (CVD), and physical vapor deposition (PVD) processes. In the semiconductor industry, Al-Fe targets are used to create thin films that enhance the performance and durability of electronic components. They also find applications in display technology, where they contribute to the production of high-quality coatings for screens and optical devices. The versatility of Al-Fe targets in both CVD and PVD techniques makes them valuable in producing uniform, high-performance coatings in various high-tech fields. |
| Composition | Al/Fe |