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| Description | Our Stoichiometric LPCVD Nitride film has many uses and is often used as a tool for defining active regions during field oxidation. If planning to use nitride as a KOH mask for through wafer etching, our Low Stress Nitride or Oxide/Nitride Film may yield the best results. All silicon wafers have been thoroughly inspected and receive a pre-furnace clean prior to LPCVD Nitride deposition. |
|---|---|
| Storage | room temp |
| Dimension | 150mm |
| Quality Level | 100 |
| Refractive Index | 2.00 +/-0.05 @ 632.8nm |
| Resistivity | 1-20 Ohm-cm |