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| Description | Our Low Stress Nitride can be used for Membranes, Cantilever Beams, and other mechanical structures associated with MEMS devices. This Silicon Rich Film is excellent as a KOH Etch Mask. All silicon wafers have been thoroughly inspected and receive a pre-furnace clean prior to LPCVD Nitride deposition. |
|---|---|
| Storage | room temp |
| Dimension | 100mm |
| Quality Level | 100 |
| Refractive Index | 2.20 +/-0.05 @ 632.8nm |
| Resistivity | 10-20 Ohm-cm |