• 24 hours a day, from Monday to Sunday.
ICON
The Best Industrial

Solution Provider

ICON
Certified Company

ISO 9001:2015 Certification

100mm Silicon Wafers 6000A Low Stress LPCVD Nitride

Catalog
ACMA00021423
DescriptionOur Low Stress Nitride can be used for Membranes, Cantilever Beams, and other mechanical structures associated with MEMS devices. This Silicon Rich Film is excellent as a KOH Etch Mask. All silicon wafers have been thoroughly inspected and receive a pre-furnace clean prior to LPCVD Nitride deposition.
Storageroom temp
Dimension100mm
Quality Level100
Refractive Index2.20 +/-0.05 @ 632.8nm
Resistivity10-20 Ohm-cm

Our products and services are for research use only and cannot be used for any clinical purpose.

Ask Your Question
Verification code