Iridium-Manganese Sputtering Target

Purity	99.95%
Application	1. Semiconductor: Iridium-Manganese sputtering targets are extensively utilized in the semiconductor industry to deposit thin films that are vital for the creation of high-performance semiconductor devices. These targets provide stability and reliability in the fabrication processes, ensuring the production of consistent and high-quality semiconductor layers essential for modern electronic components. 2. Chemical Vapor Deposition (CVD): In the realm of Chemical Vapor Deposition (CVD), Iridium-Manganese sputtering targets play a significant role. They are used to create thin, uniform films on substrates through the deposition of material in a vaporized form. The excellent thermal stability and adhesive qualities of the iridium and manganese alloy make it highly effective for CVD applications, leading to coatings that enhance the durability and functionality of various devices. 3. Physical Vapor Deposition (PVD): Iridium-Manganese sputtering targets are also critical in Physical Vapor Deposition (PVD) processes. These targets enable the deposition of thin films with high precision and uniformity, which are essential for various industrial and research applications. PVD coatings utilizing Iridium-Manganese targets provide superior hardness, wear resistance, and corrosion resistance, making them ideal for use in demanding environments and applications that require durable and high-quality surface finishes.
Composition	Ir/Mn