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| Description | Hydrogen peroxide is a strong oxidizer. It may be produced industrially by anthraquinone oxidation.It is used in semiconductor industry essentially for cleaning silicon wafers, removal of photoresists and to etch metallic copper on printed circuit boards. Ultrapurification of hydrogen peroxide by reverse osmosis has been reported in detail. |
|---|---|
| Molecular Weight | 34 |
| Molecular Formula | H2O2 |
| Boiling Point | 107 °C |
| Melting Point | -26 °C |
| Application | Semiconductor grade hydrogen peroxide was used to etch TiN and GaAs structures. |
| Storage | Room temperature |
| Assay | 30.0-32.0%w/w |
| Form | Liquid |
| Quality Level | 100 |