• 24 hours a day, from Monday to Sunday.
ICON
The Best Industrial

Solution Provider

ICON
Certified Company

ISO 9001:2015 Certification

Request a quote

Digitizing and Reverse Engineering

Reverse Engineering of Photomasks

Digitizing and Reverse Engineering originated from a real demand for this service. Alfa Chemistry has a group of professional CAD staff in our office in New York. We provide digital services to our customers. Digitization can convert paper-based photomask graphic information into digital format.

Semiconductor companies or research institutes can have many successful design kits developed over many years. They keep their designs archived. When there is a need to refresh their photomasks or move their designs to a new tool, they often find that the designs are missing or the magnetic media they are stored on have degraded. It is important that the photomask data match the originals exactly so that customer requalification is not required. The photomask reverse engineering service provided by Alfa Chemistry can perfectly solve this problem.

About Digitizing Service

Digitizing is the process of converting paper-based graphical information into a digital format. When we digitize a map, we use drawing commands to trace data from the paper map into a DWG file. Digitizing lets you take information from raster images or paper maps and enter it into a digital map.

  • It usually takes 1-2 days to submit drawing inspection data. However, if the plan allows, it may take longer.
  • The mask price includes creation data for drawing inspection. However, after obtaining drawing inspection approval, additional fees may be required for design changes.

If you need pattern digitization, please contact us for a quote.

About Reverse Engineering Service

Alfa Chemistry can reverse engineer the GDSII data in the mask. We use a high-precision microscope system to scan the mask and take pictures. The mosaic of the picture is reconstructed, and GDSII data is created using a proprietary process. The GDSII data created represents the original GDSII data used to make the masks and the layers are run through DRC checks to ensure correct overlay.

  • If the design is appropriate, the hierarchy will be restored.
  • If only certain layers are missing, we can also match existing designs.

Please contact us for the data recovery service if you have any data troubles.

Mask size4" ~ 9"
Pattern line thickness~ 3 µm
Output data±0.3 µm (tolerance against the photomask)

Photomask Data Recovery Flow

After we receive the photomask from the customer, it will go through scanning, data conversion and design data conversion steps and final inspection before delivering the data to the customer.

Reverse Engineering of Photomasks

Our products and services are for research use only and cannot be used for any clinical purpose.

Not finding what you're looking for?

If you do not find the product or would like to request a quote, please contact us.

Ask Your Question

Verification code