Zirconium-Iron Sputtering Target

Purity	99.95%
Application	Zirconium-Iron (Zr-Fe) sputtering targets are utilized across various high-tech and industrial applications, demonstrating their significant potential and value. In particular, these sputtering targets are prominent in the field of thin film deposition techniques such as Physical Vapor Deposition (PVD) and Chemical Vapor Deposition (CVD). The unique combination of zirconium and iron in the sputtering targets offers a robust solution for creating thin films that excel in mechanical strength, corrosion resistance, and thermal stability. 1. Semiconductor Industry: In the semiconductor industry, Zr-Fe sputtering targets are essential for the deposition of thin films in integrated circuits and other electronic components. The robustness and excellent wear resistance provided by Zr-Fe films ensure high performance and longevity of semiconductor devices. 2. Data Storage: The data storage industry also benefits from Zr-Fe sputtering targets. The thin films deposited using these targets enhance the magnetic properties of hard disk drives and other storage media, thereby increasing data density and reliability. 3. Optical and Functional Coatings: In the realm of optical and functional coatings, Zr-Fe sputtering targets are crucial. They are used in the production of anti-reflective coatings, optical filters, and other high-performance optical devices. The durability and high-quality finish achieved by Zr-Fe thin films make them a preferred choice in this sector. 4. Protective Coatings: For the automotive and aerospace industries, Zr-Fe sputtering targets are applied in the creation of protective coatings. These coatings safeguard components against harsh environmental conditions, wear, and corrosion. Additionally, the lightweight nature of zirconium contributes to the overall efficiency of the vehicles and aircraft.
Composition	Zr/Fe