Nickel-Chromium-Silicon Sputtering Target

Purity	99.95%
Application	Nickel-chromium-silicon sputtering targets are primarily used for the fabrication of thin film resistors and thin film capacitors in electronic devices. The performance requirements for this material include small device sizes, good stability, and a low temperature coefficient of resistance, which makes it widely applicable in fields such as semiconductor integrated circuits, flat panel displays, and solar cells.
Composition	Ni/Cr/Si