Description | Resistivity: 75-100 kΩ·cm (Prepared by spin-coating at 1000 rpm/30 s for 1 coat, followed by thermal annealing at 400°C in Ar/H2 for 3 hours) |
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Molecular Formula | MoS2 |
Appearance | dispersion |
Application | n-type semiconductor for use in transistors, photodetectors and photovoltaics |
Storage | Solid Content, 1.5-2.5% |
Form | dispersion |
Quality Level | 100 |
Viscosity | 2-4 mPa.s |