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Iron Boride Sputtering Target

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Catalog Number
ACM12006847-2
CAS
12006-84-7
Purity99.95%
ApplicationIron boride sputtering targets have important applications in the thin film deposition industry, primarily used for forming iron boride films, which are critical for various advanced technologies. Additionally, iron boride sputtering targets are widely used in the semiconductor industry and the renewable energy sector, where their excellent electrical conductivity, optical properties, and thermal stability make them suitable for the production of cutting-edge semiconductor devices and solar panels.
CompositionFeB

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