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| IUPAC Name | hafnium(4+);2-methylpropan-2-olate |
|---|---|
| Molecular Weight | 470.94 |
| Molecular Formula | Hf[OC(CH3)3]4 |
| Canonical SMILES | CC(C)(C)O[Hf](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C |
| InChI | 1S/4C4H9O.Hf/c4*1-4(2,3)5;/h4*1-3H3;/q4*-1;+4,WZVIPWQGBBCHJP-UHFFFAOYSA-N |
| InChI Key | WZVIPWQGBBCHJP-UHFFFAOYSA-N |
| Application | Hafnium tert-butoxide [Hf(OtBu)4] is a mononuclear; volatile; and highly promising precursor for the deposition of HfO2 and other hafnium doped thin films by vapor deposition techniques. The deposited films show high dielectric constant suitable for semiconductor devices. |
| Storage | room temp |
| Form | liquid |
| MDL Number | MFCD00070458 |
| Packaging | 10 g in stainless steel cylinder |
| Quality Level | 100 |