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Copper-Cobalt Sputtering Target

Catalog Number
ACMA00062455
Purity99.95%
ApplicationCopper-cobalt sputtering targets are essential in thin-film deposition for advanced technologies, particularly in electronic and magnetic devices. The combination of copper's excellent conductivity and cobalt's magnetic properties makes these targets ideal for producing magnetic data storage, spintronic devices, and integrated circuits. They are widely used in semiconductor manufacturing, where precise, conductive thin films are needed for high-performance electronics. Additionally, copper-cobalt targets are applied in magnetic sensors and memory devices, such as magnetic random-access memory (MRAM), where they enhance both functionality and durability. Their versatility makes them crucial for cutting-edge electronic and magnetic applications.
CompositionCu/Co

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