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Cobalt-Nickel Sputtering Target

Catalog Number
ACMA00062454
Purity99.5%
ApplicationCobalt-nickel sputtering targets are integral to thin-film deposition processes and are widely used in the production of electronic devices and semiconductor components. Their high purity ensures precise coatings, making them valuable in nanotechnology applications. Due to their excellent conductivity, cobalt-nickel targets are essential for manufacturing high-performance electronic circuits and thin films. Additionally, their corrosion resistance makes them ideal for creating durable and reliable coatings in harsh environments. Overall, cobalt-nickel sputtering targets play a crucial role in enhancing the functionality and longevity of various electronic and semiconductor devices.
CompositionCo/Ni

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