Cobalt-Iron-Boron Sputtering Target

Purity	99.95%
Application	Cobalt-iron-boron (CoFeB) sputtering targets are widely used for their exceptional magnetic and electrical properties, making them ideal for advanced technologies. CoFeB is commonly employed in the fabrication of magnetic tunnel junctions and other spintronic devices, where its high magnetic moment and low coercivity are crucial. These sputtering targets are essential for creating thin films used in magnetic random-access memory (MRAM), magnetic sensors, and logic devices. The composition and structure of CoFeB can be tailored to optimize its magnetic, electrical, and thermal properties, allowing it to meet the specific needs of electronic and electromagnetic applications.
Composition	Co/Fe/B