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Aluminum-Cobalt Sputtering Target

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Catalog Number
ACM11114559-1
CAS
11114-55-9
Purity99.95%
ApplicationAluminum-Cobalt sputtering targets have demonstrated significant potential and value across various high-tech fields. Specifically, these targets are widely used in CD-ROMs, decorative materials, and the semiconductor industry, particularly excelling in the manufacturing of displays, LEDs, and photovoltaic devices. Additionally, in functional coatings, other optical information storage industries, and the glass coating industry (such as automotive and architectural glass), as well as in the field of optical communication, Aluminum-Cobalt sputtering targets play a crucial role. Through Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) techniques, these targets enable the deposition of ultra-high purity thin films, thereby meeting the needs of advanced manufacturing and research. Furthermore, Aluminum-Cobalt sputtering targets are applicable in large-area coatings such as those for solar energy or fuel cells, as well as in flip-chip technology, further expanding their range of applications.
CompositionAl/Co

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