Description | Our Low Stress Nitride can be used for Membranes, Cantilever Beams and other mechanical structures associated with MEMS devices. This Silicon Rich Film is excellent as a KOH Etch Mask. All Silicon wafers have been thoroughly inspected and receive a pre-furnace clean prior to LPCVD Nitride deposition. |
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Storage | room temp |
Dimension | 100mm |
Quality Level | 100 |
Refractive Index | 2.20 +/-0.05 @ 632.8nm |
Resistivity | 1-30 Ohm-cm |